The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 03, 2023
Filed:
Aug. 20, 2020
Advanced Micro-fabrication Equipment Inc. China, Shanghai, CN;
Tuqiang Ni, Shanghai, CN;
Leyi Tu, Shanghai, CN;
ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA, Shanghai, CN;
Abstract
Plasma processor including: reaction chamber having a base for placing a wafer; a source radio-frequency power supply outputting high frequency radio-frequency power into the reaction chamber to ignite and maintain plasma; a first bias radio-frequency power supply and a second bias radio-frequency power supply, the first bias radio-frequency power supply outputting a first radio-frequency signal with first frequency, the second bias radio-frequency power supply outputting a second radio-frequency signal with second frequency higher than the first frequency, the first radio-frequency signal and the second radio-frequency signal being superimposed to form a periodical first compound signal that is applied to the base; and a controller configured for tuning at least one of amplitude, frequency, average voltage or phase of the first radio-frequency signal and of the second radio-frequency signal, such that the first compound signal experiences three consecutive stages in each cycle: falling stage, flat stage, and rising stage.