The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 03, 2023

Filed:

Mar. 10, 2022
Applicant:

Headway Technologies, Inc., Milpitas, CA (US);

Inventors:

Ying Liu, San Jose, CA (US);

Shohei Kawasaki, Sunnyvale, CA (US);

Wenyu Chen, San Jose, CA (US);

Yuhui Tang, Milpitas, CA (US);

Assignee:

Headway Technologies, Inc., Milpitas, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G11B 5/31 (2006.01); G11B 5/235 (2006.01); G11B 5/23 (2006.01); G11B 5/127 (2006.01); G11B 5/39 (2006.01); G11B 5/00 (2006.01);
U.S. Cl.
CPC ...
G11B 5/3163 (2013.01); G11B 5/1278 (2013.01); G11B 5/23 (2013.01); G11B 5/235 (2013.01); G11B 5/314 (2013.01); G11B 5/3146 (2013.01); G11B 5/3912 (2013.01); G11B 5/3916 (2013.01); G11B 2005/0024 (2013.01); Y10T 29/49034 (2015.01);
Abstract

A method of forming a spin transfer torque reversal assisted magnetic recording (STRAMR) writer is disclosed wherein a spin torque oscillator (STO) has a flux guiding layer (FGL) wherein magnetization flips to a direction substantially opposing the write gap (WG) field when sufficient current (I) density is applied across the STO between a trailing shield and main pole (MP) thereby enhancing the MP write field. The FGL has a center portion with a larger magnetization saturation×thickness (MsT) than in FGL outer portions proximate to STO sidewalls. Accordingly, lower Idensity is necessary to provide a given amount of FGL magnetization flipping and there is reduced write bubble fringing compared with writers having a FGL with uniform MsT. Lower MsT is achieved by partially oxidizing FGL outer portions. In some embodiments, there is a gradient in outer FGL portions where MsT increases with increasing distance from FGL sidewalls.


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