The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 03, 2023

Filed:

Mar. 07, 2022
Applicant:

Zhejiang Gongshang University, Hangzhou, CN;

Inventors:

Huiyan Wang, Hangzhou, CN;

Huayang Li, Hangzhou, CN;

Jun Luo, Hangzhou, CN;

Zeyuan Shao, Hangzhou, CN;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06V 40/20 (2022.01); G06V 10/82 (2022.01); G06V 10/54 (2022.01); G06V 10/776 (2022.01); G06V 10/26 (2022.01); G06V 10/46 (2022.01); G06V 10/80 (2022.01); G06V 10/56 (2022.01);
U.S. Cl.
CPC ...
G06V 40/25 (2022.01); G06V 10/26 (2022.01); G06V 10/46 (2022.01); G06V 10/54 (2022.01); G06V 10/56 (2022.01); G06V 10/776 (2022.01); G06V 10/806 (2022.01); G06V 10/82 (2022.01);
Abstract

An end-to-end multimodal gait recognition method based on deep learning includes: first extracting gait appearance features (color, texture and the like) through RGB video frames, and obtaining a mask by semantic segmentation of the RGB video frames; then extracting gait mask features (contour and the like) through the mask; and finally performing fusion and recognition on the two kinds of features. The method is configured for extracting gait appearance feature and mask feature by improving GaitSet, improving semantic segmentation speed on the premise of ensuring accuracy through simplified FCN, and fusing the gait appearance feature and the mask feature to obtain a more complete information representation.


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