The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 03, 2023
Filed:
Nov. 30, 2020
Shenzhen Goodix Technology Co., Ltd., Shenzhen, CN;
SHENZHEN GOODIX TECHNOLOGY CO., LTD., Shenzhen, CN;
Abstract
Techniques are described for passive three-dimensional (3D) face imaging based on macro-structure and micro-structure image sizing, such as for biometric facial recognition. A set of images of a user's face is processed to extract authentication deterministic macro-structure (DMAS) measurements. A database includes profile DMAS measurements, profile location definitions for deterministic micro-structure (DMIS) feature regions, and profile DMIS signatures computed for the DMIS feature regions. A first-level authentication determination can be based on comparing the authentication DMAS measurements with the profile DMAS measurements. Authentication DMIS signatures can be computed from sub-images obtained for the DMIS feature regions at the profile location definitions. A second-level authentication determination can be based on comparing the authentication DMIS signatures with the profile DMIS signatures. An authentication result can be output based on both the first-level authentication determination and the second-level authentication that indicates whether authentication of the user is granted or denied.