The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 03, 2023

Filed:

Feb. 18, 2021
Applicant:

Sumitomo Chemical Company, Limited, Tokyo, JP;

Inventors:

Masako Sugihara, Osaka, JP;

Takashi Nishimura, Osaka, JP;

Junji Nakanishi, Osaka, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/023 (2006.01); G03F 7/022 (2006.01); G03F 7/30 (2006.01); G03F 7/039 (2006.01); C08F 212/14 (2006.01); G03F 7/038 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0233 (2013.01); C08F 212/24 (2020.02); G03F 7/0236 (2013.01); G03F 7/038 (2013.01); G03F 7/039 (2013.01); G03F 7/30 (2013.01);
Abstract

The present invention provides a resist composition which has sufficient resistant to a plating treatment and is capable of forming a resist pattern with high accuracy. The present invention also provides a method for producing a resist pattern using the resist composition, and a method for producing a plated molded article using the resist pattern. The present invention relates to a resist composition comprising a compound (I) having a quinone diazide sulfonyl group, a resin comprising a structural unit having an acid-labile group (A1), an alkali-soluble resin (A2) and an acid generator (B); a method for producing a resist pattern using the resist composition; and a method for producing a plated molded article using the resist pattern.


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