The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 03, 2023
Filed:
Nov. 02, 2020
Beam Engineering for Advanced Measurement Co., Orlando, FL (US);
Nelson V. Tabirian, Winter Park, FL (US);
Mark J. Moran, Winter Park, FL (US);
Olena Uskova, Winter Park, FL (US);
Justin Sigley, Lake Mary, FL (US);
Beam Engineering for Advanced Measurements Co., Orlando, FL (US);
Abstract
Methods, materials, systems, and devices for stabilizing photoalignment patterns in liquid crystal diffractive waveplates (LCDWs) against radiation, mechanical, and electrical influences by creating a polymer network within the bulk of LCDW such as the polymer network does not affect the LC orientation pattern in the bulk of the DW and does not result in residual retardation and light scattering while being able to fast switching and relaxation with no haze at application of electric fields.