The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 03, 2023

Filed:

Mar. 12, 2021
Applicant:

Seiko Epson Corporation, Tokyo, JP;

Inventor:

Takehiko Hagihara, Azumino, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 21/20 (2006.01); G02B 7/02 (2021.01); G02B 19/00 (2006.01); G02B 5/02 (2006.01);
U.S. Cl.
CPC ...
G02B 7/026 (2013.01); G02B 5/0278 (2013.01); G02B 19/0047 (2013.01); G03B 21/208 (2013.01);
Abstract

A diffusion apparatus includes a diffuser, a substrate to which the diffuser is fixed, and a first lens that has a curved surface and a flat surface located on the side opposite the curved surface and is so fixed to the substrate as to face the diffuser. The substrate includes a first recess having a first bottom surface and a first side surface that rises from the first bottom surface and a second recess having a second bottom surface connected to the first side surface and a second side surface that rises from the second bottom surface. The first lens is so disposed in the second recess that the flat surface is in contact with the second bottom surface. The diffuser is fixed to the first bottom surface.


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