The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 03, 2023

Filed:

Mar. 29, 2019
Applicant:

Kornit Digital Technologies Ltd., Rosh HaAyin, IL;

Inventor:

Travis Alexander Busbee, Somerville, MA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C 64/00 (2017.01); B29C 64/129 (2017.01); B29C 64/307 (2017.01); B33Y 40/20 (2020.01); B33Y 99/00 (2015.01); B29C 64/20 (2017.01); B33Y 50/00 (2015.01); B29C 64/40 (2017.01); B29C 64/227 (2017.01); B33Y 80/00 (2015.01); B33Y 30/00 (2015.01); B29C 64/10 (2017.01); B33Y 40/00 (2020.01); B29C 64/255 (2017.01); B29C 64/245 (2017.01); B33Y 40/10 (2020.01); B29C 64/25 (2017.01); B29C 64/30 (2017.01); B29C 64/182 (2017.01); B29C 64/176 (2017.01); B29C 64/205 (2017.01); B33Y 70/00 (2020.01); B33Y 10/00 (2015.01);
U.S. Cl.
CPC ...
B29C 64/129 (2017.08); B29C 64/00 (2017.08); B29C 64/10 (2017.08); B29C 64/176 (2017.08); B29C 64/182 (2017.08); B29C 64/20 (2017.08); B29C 64/205 (2017.08); B29C 64/227 (2017.08); B29C 64/245 (2017.08); B29C 64/25 (2017.08); B29C 64/255 (2017.08); B29C 64/30 (2017.08); B29C 64/307 (2017.08); B29C 64/40 (2017.08); B33Y 30/00 (2014.12); B33Y 40/00 (2014.12); B33Y 40/10 (2020.01); B33Y 40/20 (2020.01); B33Y 50/00 (2014.12); B33Y 70/00 (2014.12); B33Y 80/00 (2014.12); B33Y 99/00 (2014.12); B33Y 10/00 (2014.12);
Abstract

Embodiments related to systems and methods of forming structures on substrates (e.g., flexible substrates, fabrics, textiles, leathers) are disclosed. In some embodiments, a method of forming a structure on a substrate is provided. The method may involve submerging at least one surface of the substrate into a resin bath. The method may include patterning electromagnetic radiation through a window onto one or more regions of the substrate to polymerize the resin onto the one or more regions of the substrate. An alternative method may involve covering a surface of the substrate with a layer of polymeric powder. The alternative method may include directing electromagnetic radiation toward one or more regions on the surface of the substrate to heat the polymeric powder to form a layer on the surface of the substrate. A method of depositing an ultraviolet (UV)-curable material onto a substrate by a valve jetting process is also provided.


Find Patent Forward Citations

Loading…