The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 27, 2022

Filed:

Oct. 18, 2019
Applicant:

Leica Microsystems Cms Gmbh, Wetzlar, DE;

Inventors:

Christian Schumann, Lich, DE;

Tobias Bauer, Koenigstein/Ts, DE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 21/00 (2006.01); G06T 5/00 (2006.01); G06T 5/20 (2006.01);
U.S. Cl.
CPC ...
G02B 21/008 (2013.01); G06T 5/006 (2013.01); G06T 5/20 (2013.01); G06T 2207/10056 (2013.01);
Abstract

A method is useable for digitally correcting an optical image of a sample by a microscope that has a cover slip covering the sample. The method includes: determining, by the microscope, an index of refraction of an optical medium bordering the cover slip, a tilt of the cover slip, and/or a thickness of the cover slip; ascertaining an imaging error to be corrected in the form of a pupil function based on the index of refraction of the optical medium, the tilt of the cover slip, and/or the thickness of the cover slip; carrying out imaging of the sample by the microscope; and digitally correcting image data captured by the imaging of the sample based on the pupil function.


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