The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 27, 2022

Filed:

Jun. 14, 2019
Applicant:

Spraying Systems Co., Wheaton, IL (US);

Inventors:

Chad Sipperley, Palm City, FL (US);

Rudolf J. Schick, Forest Park, IL (US);

Kyle M. Bade, Rockford, MI (US);

Assignee:

Spraying Systems Co., Wheaton, IL (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 15/02 (2006.01); G06G 7/48 (2006.01); G06G 7/52 (2006.01); G01N 15/00 (2006.01);
U.S. Cl.
CPC ...
G01N 15/0205 (2013.01); G01N 15/02 (2013.01); G06G 7/485 (2013.01); G06G 7/52 (2013.01); G01N 2015/0053 (2013.01);
Abstract

A system and method are described for rendering a characteristic for a set of particles passing through a measurement volume of a particle optical measurement system. The method includes acquiring raw particle data for the particles passing through the measurement volume. The raw particle data comprises a set of raw particle records. Each particle record comprises at least: a trajectory of at least one particle, and a second primary mark of the at least one particle whose value influences an effective sampling area corresponding to the measurement volume. The method includes generating and storing an effective sampling area based upon: the trajectory of the at least one particle, and the second primary mark. Thereafter, an ensemble characteristic is rendered for the set of particles by performing an operation on the sampling area-corrected set of particle records.


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