The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 27, 2022

Filed:

Sep. 14, 2017
Applicant:

Jfe Steel Corporation, Tokyo, JP;

Inventors:

Yoichi Makimizu, Tokyo, JP;

Gentaro Takeda, Tokyo, JP;

Hiroshi Hasegawa, Tokyo, JP;

Yoshimasa Himei, Tokyo, JP;

Yoshikazu Suzuki, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 2/02 (2006.01); C23C 2/06 (2006.01); C23C 2/40 (2006.01); C22C 38/02 (2006.01); C22C 38/04 (2006.01); C22C 38/06 (2006.01); C22C 38/00 (2006.01); C22C 38/60 (2006.01); C22C 38/14 (2006.01); C22C 38/12 (2006.01); C22C 38/16 (2006.01); C22C 38/38 (2006.01); C22C 38/08 (2006.01); C22C 38/32 (2006.01); C22C 38/28 (2006.01); C22C 38/26 (2006.01); C22C 38/22 (2006.01); C21D 9/46 (2006.01); C21D 1/76 (2006.01); C23C 2/28 (2006.01); C21D 9/56 (2006.01);
U.S. Cl.
CPC ...
C23C 2/02 (2013.01); C21D 1/76 (2013.01); C21D 9/46 (2013.01); C21D 9/561 (2013.01); C22C 38/00 (2013.01); C22C 38/008 (2013.01); C22C 38/02 (2013.01); C22C 38/04 (2013.01); C22C 38/06 (2013.01); C22C 38/08 (2013.01); C22C 38/12 (2013.01); C22C 38/14 (2013.01); C22C 38/16 (2013.01); C22C 38/22 (2013.01); C22C 38/26 (2013.01); C22C 38/28 (2013.01); C22C 38/32 (2013.01); C22C 38/38 (2013.01); C22C 38/60 (2013.01); C23C 2/06 (2013.01); C23C 2/28 (2013.01); C23C 2/40 (2013.01);
Abstract

Provided is a method for manufacturing a high-strength galvanized steel sheet. Heating in a first half of oxidizing treatment is performed at a temperature of 400° C. to 750° C. in an atmosphere having a particular Oconcentration and a particular HO concentration, and heating in a second half of the oxidizing treatment is performed at a temperature of 600° C. to 850° C. in an atmosphere having a particular Oconcentration and a particular HO concentration. Subsequently, heating in a heating zone for reduction annealing is performed to a temperature of 650° C. to 900° C. at a particular heating rate in an atmosphere having a particular Hconcentration and a particular HO concentration with the balance being Nand inevitable impurities, and soaking in a soaking zone for the reduction annealing is performed in an atmosphere having a particular Hconcentration and a particular HO concentration with the balance being Nand inevitable impurities.


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