The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 27, 2022

Filed:

Jul. 17, 2020
Applicant:

Dmitry Medvedev, Moscow, RU;

Inventor:

Dmitry Medvedev, Moscow, RU;

Assignee:

Other;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C02F 1/46 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
C02F 1/4608 (2013.01); H01J 37/3277 (2013.01); H01J 37/32082 (2013.01); H01J 37/32348 (2013.01); H01J 37/32541 (2013.01); H01J 37/32899 (2013.01); C02F 2303/04 (2013.01); C02F 2305/023 (2013.01); H01J 2237/338 (2013.01);
Abstract

A system for generation of radicals in a liquid (e.g., OH and derivatively HOin water) by a plasma reactor, including a first electrode having a rod shape or a tubular shape; a dielectric tubular housing coaxial with the first electrode and enclosing the first electrode, and having a gap to the first electrode of 0.3-30 mm; a second electrode on an outside of the dielectric tubular housing and coaxial with first electrode with a gap 0.3-30 mm; a high voltage power supply providing voltage oscillations or pulses of 0.5-30 kV and a frequency 1-50 kHz between the first and second electrodes; and a pump or a Venturi injector on an output of the plasma reactor and a chock valve on an input of reactor for generating a low water pressure in the gap between first and second electrodes so as to generate boiling in the gap.


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