The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 27, 2022

Filed:

Jun. 14, 2021
Applicants:

Sumitomo Electric Hardmetal Corp., Itami, JP;

Sumitomo Electric Industries, Ltd., Osaka, JP;

Inventors:

Fumiyoshi Kobayashi, Itami, JP;

Anongsack Paseuth, Itami, JP;

Yasuki Kido, Itami, JP;

Kosuke Tominaga, Osaka, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23B 27/14 (2006.01); C23C 16/36 (2006.01);
U.S. Cl.
CPC ...
B23B 27/148 (2013.01); C23C 16/36 (2013.01); B23B 2228/105 (2013.01);
Abstract

A cutting tool includes a substrate and a coated film arranged on the substrate. The coated film includes a first layer. The first layer includes a plurality of crystal grains. The crystal grains are composed of AlTiCN, wherein x is more than 0.65 and less than 0.95, and y is not less than 0 and less than 0.1. In a first region, the crystal grains have an average aspect ratio of not more than 3.0. In a second region, the crystal grains have an average aspect ratio of more than 3.0 and not more than 10.0. The crystal grains include crystal grains having a cubic crystal structure. The first layer has a ratio of an area occupied by the crystal grains having a cubic crystal structure of not less than 90%. The first layer has a thickness of not less than 2 μm and not more than 20 μm.


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