The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 20, 2022

Filed:

Jul. 08, 2019
Applicant:

Kabushiki Kaisha Tokai-rika-denki-seisakusho, Aichi-ken, JP;

Inventor:

Yoshikazu Kataoka, Aichi-ken, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/02 (2006.01); H01L 29/66 (2006.01); H01L 27/06 (2006.01); H01L 29/74 (2006.01);
U.S. Cl.
CPC ...
H01L 27/0255 (2013.01); H01L 29/66393 (2013.01); H01L 27/067 (2013.01); H01L 27/0676 (2013.01); H01L 29/66 (2013.01); H01L 29/6609 (2013.01); H01L 29/7436 (2013.01);
Abstract

A semiconductor device including a protected element, a contact region, wiring, and a channel stopper region. The protected element is configured including a p-n junction diode between an anode region and a cathode region, and is arranged in an active layer of a substrate. The periphery of the diode is surrounded by an element isolation region. The contact region is arranged at a portion on a main face of the anode region, and is set with a same conductivity type as the anode region, and set with a higher impurity concentration than the anode region. The wiring is arranged over the diode. One end portion of the wiring is connected to the contact region and another end portion extends over a passivation film. The channel stopper region is arranged at a portion on the main face of the anode region under the wiring between the contact region and the element isolation region, and is set with an opposite conductivity type to the contact region.


Find Patent Forward Citations

Kataoka, Yoshikazu. (2022). Semiconductor device and method for manufacturing same (U.S. Patent No. 11532608). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11532608

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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