The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 20, 2022

Filed:

Mar. 08, 2021
Applicants:

Kabushiki Kaisha Toshiba, Tokyo, JP;

Toshiba Electronic Devices & Storage Corporation, Tokyo, JP;

Inventors:

Munenori Sakai, Kanagawa, JP;

Akio Sakata, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/522 (2006.01); H01L 23/528 (2006.01);
U.S. Cl.
CPC ...
H01L 23/5223 (2013.01); H01L 23/5226 (2013.01); H01L 23/5286 (2013.01);
Abstract

A semiconductor device of an embodiment includes: a plurality of power lines extending in a first direction; and a plurality of cells arrayed along the first direction and a second direction intersecting the first direction and having a cell height of an integer multiple of a distance between the power lines adjacent to each other in the second direction, the cell height being a dimension in the second direction, wherein the plurality of cells include: a functional cell that contributes to a function of the semiconductor device; and a capacitance cell including a diffusion region of a first conductivity type and a gate electrode stacked above the diffusion region, and functioning as a decoupling capacitor, the capacitance cell is configured as a multi-height cell having a cell height of two or more times the distance, the capacitance cell includes a plurality of overlapping regions that are regions of the gate electrode overlapping the diffusion region in a stacking direction, the overlapping regions being aligned in the second direction, and the plurality of overlapping regions are arranged in one continuous well of a second conductivity type different from the first conductivity type.


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