The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 20, 2022
Filed:
Aug. 10, 2020
Applicants:
Applied Materials, Inc., Santa Clara, CA (US);
Wayne State University, Detroit, MI (US);
Inventors:
Thomas Knisley, Livonia, MI (US);
Keenan N. Woods, San Ramon, CA (US);
Mark Saly, Santa Clara, CA (US);
Charles H. Winter, Bloomfield Hills, MI (US);
Stefan Cwik, Braintree, MA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); C23C 16/34 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02175 (2013.01); C23C 16/34 (2013.01); H01L 21/0228 (2013.01); H01L 21/02205 (2013.01);
Abstract
Methods for depositing rhenium-containing thin films on a substrate are described. The substrate is exposed to a rhenium precursor and a reducing agent to form the rhenium-containing film (e.g., metallic rhenium, rhenium nitride, rhenium oxide, rhenium carbide). The exposures can be sequential or simultaneous. The rhenium-precursors are substantially free of halogen.