The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 20, 2022

Filed:

Feb. 07, 2021
Applicant:

Nanjing University of Aeronautics and Astronautics, Jiangsu, CN;

Inventors:

Jun Wang, Jiangsu, CN;

Kun Long, Jiangsu, CN;

Qian Xie, Jiangsu, CN;

Dening Lu, Jiangsu, CN;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2022.01); G06T 17/00 (2006.01); G06V 20/00 (2022.01);
U.S. Cl.
CPC ...
G06T 17/00 (2013.01); G06V 20/00 (2022.01); G06T 2207/10028 (2013.01); G06T 2207/30252 (2013.01);
Abstract

A method for measuring a seam on aircraft skin based on a large-scale point cloud is disclosed. A point cloud density of each point in an aircraft skin point cloud is calculated. Seam and non-seam point clouds are divided according to a discrepancy of the calculated point cloud density. A point is selected from the point cloud of the seam area, and a section at the point is extracted. A certain range of the seam and non-seam point clouds is projected to the section and a projected point cloud is acquired. A calculation model of flush and gap is constructed, and the flush and the gap of the aircraft skin seam at the measuring point is calculated according to the projected point cloud and the calculation model.


Find Patent Forward Citations

Loading…