The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 20, 2022

Filed:

Aug. 17, 2020
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Ashok Pon Kumar Sree Prakash, Bangalore, IN;

Meenakshi Ravisankar, Vijayawada, IN;

Amith Singhee, Bangalore, IN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 30/20 (2020.01); G06F 17/16 (2006.01);
U.S. Cl.
CPC ...
G06F 30/20 (2020.01); G06F 17/16 (2013.01);
Abstract

A method for guided design generation includes receiving a plurality of image samples for an intended design and generating a first plurality of images by providing a positive latent vector to a first layer out of a plurality of layers and a negative latent vector to remaining layers out of the plurality of layers. Responsive to receiving a first image selection, identifying the first layer out of the plurality of layers generated the first image includes a feature of interest. Determining a feature expression variation for the feature of interest in latent space based on the ranking of a first plurality of generated sample images, wherein the first plurality of generated sample images includes the feature of interest. Responsive to receiving a second plurality of images for a plurality of base features, generating an initial design based on the feature of interest and the plurality of base features.


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