The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 20, 2022

Filed:

Apr. 12, 2017
Applicant:

Nippon Telegraph and Telephone Corporation, Chiyoda-ku, JP;

Inventors:

Hiroaki Gomi, Atsugi, JP;

Sho Ito, Atsugi, JP;

Shinya Takamuku, Atsugi, JP;

Tomohiro Amemiya, Atsugi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H04B 3/36 (2006.01); G06F 3/0488 (2022.01); H04M 19/04 (2006.01); H02K 33/16 (2006.01); H02K 16/00 (2006.01); B06B 1/04 (2006.01); H02K 7/18 (2006.01); H02K 35/02 (2006.01); H02K 35/04 (2006.01);
U.S. Cl.
CPC ...
G06F 3/0488 (2013.01); B06B 1/04 (2013.01); H02K 7/1876 (2013.01); H02K 16/00 (2013.01); H02K 33/16 (2013.01); H02K 35/02 (2013.01); H02K 35/04 (2013.01); H04M 19/04 (2013.01); H02K 2201/18 (2013.01);
Abstract

For efficient presentation of pseudo force sense, a pseudo force sense generation apparatus includes: a base mechanism; and a contact mechanism that performs periodical asymmetric motion relative to the base mechanism and gives force based on the asymmetric motion to skin or mucous membrane with which the contact mechanism is in direct or indirect contact. A mass of the contact mechanism is smaller than a mass of the base mechanism, or the mass of the contact mechanism is smaller than a sum of the mass of the base mechanism and a mass of a mechanism that is attached to the base mechanism.


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