The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 20, 2022

Filed:

Jul. 25, 2018
Applicant:

Lg Chem, Ltd., Seoul, KR;

Inventors:

Min Young Lim, Daejeon, KR;

Tae Seob Lee, Daejeon, KR;

Ji Hye Kim, Daejeon, KR;

Assignee:

LG CHEM, LTD., Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/039 (2006.01); G03F 7/30 (2006.01); G03F 7/033 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0397 (2013.01); G03F 7/033 (2013.01); G03F 7/039 (2013.01); G03F 7/0392 (2013.01); G03F 7/30 (2013.01);
Abstract

The present invention provides a positive photoresist composition having excellent storage stability, sensitivity, developing properties, plating resistance, and heat resistance. More specifically, a specific dissolution inhibitor in the form of an oligomer having the same repeating unit structure as the resin contained in the photoresist composition is applied to said composition.


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