The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 20, 2022

Filed:

Jul. 08, 2021
Applicant:

Fujifilm Business Innovation Corp., Tokyo, JP;

Inventors:

Seiji Ono, Ebina, JP;

Yoshinao Kondo, Ebina, JP;

Mutsuya Takahashi, Ebina, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F21K 9/90 (2016.01); B32B 38/10 (2006.01); F21V 23/00 (2015.01);
U.S. Cl.
CPC ...
F21K 9/90 (2013.01); B32B 38/10 (2013.01); F21V 23/002 (2013.01); B32B 2457/00 (2013.01);
Abstract

A method for manufacturing a laminated substrate includes removing a portion not covered with a resist layer from a laminated substrate with an etchant to form a wiring, the laminated substrate including: a base layer including a mesa portion having a trapezoidal cross section, the mesa portion having a first inclined surface extending downward and outward from a top surface and a second inclined surface having an eaves-shaped portion protruding outward from the top surface; a wiring layer formed on an upper surface of the base layer; and the resist layer formed on an upper surface of the wiring layer and having a shape corresponding to a shape of the wiring, and the wiring is arranged at a position where the wiring covers a whole of the eaves-shaped portion of the second inclined surface.


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