The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 13, 2022

Filed:

Oct. 30, 2020
Applicant:

Monolithic Power Systems, Inc., San Jose, CA (US);

Inventors:

Ignacio Cortes Mayol, Sant Cugat del Valles, ES;

Philippe Godignon, Valldoreix, ES;

Victor Soler, Sabadell, ES;

Jose Rebollo, Sabadell, ES;

Assignee:

Monolithic Power Systems, Inc., San Jose, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/40 (2006.01); H01L 29/66 (2006.01); H01L 29/78 (2006.01); H01L 29/808 (2006.01);
U.S. Cl.
CPC ...
H01L 29/407 (2013.01); H01L 29/66893 (2013.01); H01L 29/7832 (2013.01); H01L 29/8083 (2013.01);
Abstract

A field-plate trench FET having a drain region, an epitaxial layer, a source region, a gate conductive layer formed in a trench, a field-plate dielectric layer formed on vertical sidewalls of the trench, a well region formed below the trench, a source contact and a gate contact. When the well region is in direct physical contact with the gate conductive layer, the field-plate trench FET can be used as a normally-on device working depletion mode, and when the well region is electrically isolated from the gate conductive layer by the field-plate layer, the field-plate trench FET can be used as a normally-off device working in an accumulation-depletion mode.


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