The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 13, 2022

Filed:

Jul. 01, 2020
Applicant:

Marvell Asia Pte, Ltd., Singapore, SG;

Inventor:

Runzi Chang, Saratoga, CA (US);

Assignee:

MARVELL ASIA PTE LTD, Singapore, SG;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/40 (2006.01); H01L 21/765 (2006.01); H01L 27/088 (2006.01);
U.S. Cl.
CPC ...
H01L 29/404 (2013.01); H01L 21/765 (2013.01); H01L 27/088 (2013.01);
Abstract

A semiconductor device includes a core gate and a pair of isolation gates. The core gate has a first stack of two or more layers, the first stack including at least (i) a first dielectric layer having a first thickness and (ii) a first electrode layer. The isolation gates are formed on first and second sides of the core gate. The isolation gates are configured to electrically isolate the core gate. At least one of the isolation gates has a second stack of two or more layers, the second stack including at least (i) a second dielectric layer having a second thickness greater than the first thickness and (ii) a second electrode layer.


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