The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 13, 2022

Filed:

Dec. 14, 2020
Applicant:

Vanguard International Semiconductor Corporation, Hsinchu, TW;

Inventors:

Karuna Nidhi, Patna, IN;

Chih-Hsuan Lin, Hsinchu, TW;

Jian-Hsing Lee, Puzih, TW;

Hwa-Chyi Chiou, Hsinchu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/06 (2006.01); H01L 27/02 (2006.01);
U.S. Cl.
CPC ...
H01L 29/0619 (2013.01); H01L 27/0262 (2013.01);
Abstract

A semiconductor device includes at least one transistor, a shallow well region, a guard ring, and a plurality of first and second doped regions. The transistor is on a substrate and includes a source structure, a gate structure, and a drain structure. The shallow well region surrounds the transistor. The shallow well region has a first conductivity type. The guard ring surrounds the shallow well region. The guard ring has the first conductivity type. The first and second doped regions are disposed on the guard ring and surround the well region. The first doped regions and the second doped regions are alternately arranged in a shape of a loop. Each of the first doped regions and each of the second doped regions have opposite conductivity types.


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