The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 13, 2022

Filed:

Mar. 19, 2021
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Artur M. Gruszecki, Cracow, PL;

Andrzej Jan Wrobel, Cracow, PL;

Tomasz Sekman, Cracow, PL;

Tomasz Kazalski, Balice, PL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 7/00 (2006.01); G06F 16/23 (2019.01); G06F 16/242 (2019.01);
U.S. Cl.
CPC ...
G06F 16/2393 (2019.01); G06F 16/2433 (2019.01);
Abstract

The present disclosure relates to a method comprising incorporating a utilization level field for a set of materialized views of database system in a database catalog of the database system. A computer process may be generated to run during a defined time period on a spare host of the database system. The computer process is configured to monitor utilization of the set of materialized views and to collect data of utilized materialized views in a dedicated registry. A check if each materialized view of the set of materialized views is present in the registry may be periodically be performed. The utilization level of a materialized view may be adapted based on its collected data in the registry. A check in catalog utilization levels of the set of materialized views may periodically be performed and based on the utilization levels utilization of the set of materialized views may be adapted.


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