The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 13, 2022

Filed:

Nov. 18, 2020
Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventors:

Craig William Cone, Austin, TX (US);

Qi Ni, Pflugerville, TX (US);

Steven Wayne Burns, Austin, TX (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); B05C 11/02 (2006.01); B05C 5/02 (2006.01); B05B 13/02 (2006.01); B05B 3/02 (2006.01); B05B 1/14 (2006.01); B05C 11/08 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0002 (2013.01); B05B 1/14 (2013.01); B05B 3/02 (2013.01); B05B 13/0228 (2013.01); B05C 5/027 (2013.01); B05C 11/023 (2013.01); B05C 11/08 (2013.01);
Abstract

A dispensing system comprises a first dispenser and a second dispenser each including a first end, a second end, a longitudinal axis extending through the first end and the second end, and a set of nozzles arranged about the longitudinal axis. The first dispenser is positioned relative to the second dispenser such that the longitudinal axis of the first dispenser is non-coaxial with the longitudinal axis of the second dispenser. The dispensing system also comprises a substrate chuck configured to hold a substrate and a rotation mechanism configured to rotate the substrate chuck around a rotation axis or configured to rotate the first dispenser and the second dispenser around the rotation axis.


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