The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 13, 2022
Filed:
Mar. 28, 2018
Park & Diamond Inc., Brooklyn, NY (US);
PARK & DIAMOND INC., New York, NY (US);
Abstract
A helmet of a layered and segmented design including impact attenuation structures may include a series of layers that individually, or in combination, provide the necessary functions of the helmet. The helmet may feature a layer with a low coefficient of friction to act as a slip layer and slide due to rotational force. The present technology includes impact attenuation structures of predetermined geometries, layers, and materials to allow for an appropriate impact response with a certain degree of control over the buckling process and an adaptive impact response. The present technology of impact attenuation structures may be applicable where impact absorption and controlled buckling is desired, such as bike helmets.