The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 06, 2022
Filed:
Mar. 20, 2018
Applicant:
Fuji Corporation, Chiryu, JP;
Inventor:
Takahiro Jindo, Anjo, JP;
Assignee:
FUJI CORPORATION, Chiryu, JP;
Primary Examiner:
Int. Cl.
CPC ...
H05H 1/24 (2006.01); H05H 1/36 (2006.01);
U.S. Cl.
CPC ...
H05H 1/2406 (2013.01); H05H 1/36 (2013.01);
Abstract
The object of the present disclosure is to efficiently generate plasma. In the plasma device of the present disclosure, a dielectric barrier discharger and an arc discharger are included, but the arc discharger is provided downstream from the dielectric barrier discharger in a discharge space where a gas for generating plasma is supplied. Dielectric barrier discharge occurs at the dielectric barrier discharger, and arch discharge occurs at the arc discharger. As a result of the gas for generating plasma being activated in the dielectric barrier discharge, the aforementioned gas can be adequately converted to plasma in the arc discharger.