The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 06, 2022

Filed:

Feb. 10, 2021
Applicant:

Melexis Technologies SA, Bevaix, CH;

Inventors:

Kuan-Ting Ho, Reutlingen, DE;

Lucian Barbut, Renens, CH;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 43/06 (2006.01); H01L 43/14 (2006.01); H01L 43/04 (2006.01);
U.S. Cl.
CPC ...
H01L 43/065 (2013.01); H01L 43/04 (2013.01); H01L 43/14 (2013.01);
Abstract

A semiconductor stack for a Hall effect device, which comprises: a bottom barrier comprising AlGaAs, a channel comprising InGaAs, on the bottom barrier, a channel barrier with a thickness which is at least 2 nm and which is smaller than or equal to 15 nm, and which at least comprises a first layer comprising AlGaAs with 0.1≤z≤0.22, wherein the first layer has a thickness of at least 2 nm, wherein a conduction band edge of the bottom barrier and the first layer is higher than a conduction band edge of the channel, a doping layer comprising a composition of Al, Ga and As and doped with n-type material, a top barrier comprising a composition of Al, Ga and As.


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