The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 06, 2022

Filed:

Sep. 02, 2020
Applicant:

Kioxia Corporation, Tokyo, JP;

Inventors:

Ryosuke Yamamoto, Aichi, JP;

Koji Asakawa, Kanagawa, JP;

Ayaka Suko, Kanagawa, JP;

Assignee:

KIOXIA CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/027 (2006.01); H01L 21/02 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0271 (2013.01); G03F 7/0002 (2013.01); H01L 21/02118 (2013.01); H01L 21/02282 (2013.01); H01L 21/02337 (2013.01);
Abstract

A pattern formation method includes forming an organic film on a substrate, processing the organic film to form an organic film pattern, exposing the organic film pattern to an organic gas, and exposing the organic film pattern to a metal-containing gas, and after (i) exposing the organic film pattern to the organic gas and (ii) exposing the organic film pattern to the metal-containing gas, treating the organic film pattern with an oxidizing agent.


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