The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 06, 2022

Filed:

May. 21, 2020
Applicant:

Reno Technologies, Inc., Wilmington, DE (US);

Inventor:

Michael Gilliam Ulrich, Delran, NJ (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); H03H 7/40 (2006.01); H01L 21/66 (2006.01); C23C 16/50 (2006.01); H03H 7/38 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32183 (2013.01); C23C 16/50 (2013.01); H01J 37/3299 (2013.01); H01J 37/32935 (2013.01); H01L 22/14 (2013.01); H01L 22/20 (2013.01); H01L 22/26 (2013.01); H03H 7/38 (2013.01); H03H 7/40 (2013.01); H01J 2237/24495 (2013.01); H01J 2237/24564 (2013.01);
Abstract

In one embodiment, the present disclosure is directed to a method for impedance matching. A matching network includes a first reactance element and a second reactance element. A sensor detects a value related to the plasma chamber or the matching network, and a system parameter is determined based on the detected value. For the determined system parameter, an error-related value is calculated for each of a plurality of potential first reactance element positions or for each of a plurality of potential second reactance element positions. A new first reactance element position and a new second reactance element position are calculated based on the error-related values calculated in the prior step. The first reactance element and the second reactance element are then altered to their new positions to reduce a reflected power.


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