The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 06, 2022

Filed:

Nov. 08, 2021
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Michael Rice, Pleasanton, CA (US);

Joseph AuBuchon, San Jose, CA (US);

Sanjeev Baluja, Campbell, CA (US);

Ashley M. Okada, San Jose, CA (US);

Alexander Fernandez, San Francisco, CA (US);

Ming Xu, San Jose, CA (US);

Marcel E. Josephson, San Jose, CA (US);

Sushant Suresh Koshti, Sunnyvale, CA (US);

Kenneth Le, Fremont, CA (US);

Kevin M. Brashear, San Jose, CA (US);

Assignee:

APPLIED MATERIALS, INC., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G05D 7/06 (2006.01); G01F 25/00 (2022.01); G01F 25/17 (2022.01);
U.S. Cl.
CPC ...
G05D 7/0652 (2013.01); G01F 25/00 (2013.01); G01F 25/17 (2022.01);
Abstract

Gas distribution apparatus to provide uniform flows of gases from a single source to multiple processing chambers are described. A regulator is positioned at an upstream end of a shared volume having a plurality of downstream ends. A flow controller is positioned at each downstream end of the shared volume, the flow controller comprising an orifice and a fast pulsing valve. Methods of using the gas distribution apparatus and calibrating the flow controllers are also described.


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