The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 06, 2022
Filed:
Jan. 23, 2018
Applicant:
Toyota School Foundation, Nagoya, JP;
Inventor:
Minoru Sasaki, Nagoya, JP;
Assignee:
Toyota School Foundation, Nagoya, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/09 (2006.01); G03F 7/20 (2006.01); H01L 21/027 (2006.01); H01L 23/544 (2006.01); H01L 21/033 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/09 (2013.01); G03F 7/00 (2013.01); G03F 7/0002 (2013.01); G03F 7/0005 (2013.01); G03F 7/0037 (2013.01); G03F 7/2004 (2013.01); G03F 7/2006 (2013.01); H01L 21/027 (2013.01); H01L 21/0272 (2013.01); H01L 21/0274 (2013.01); H01L 21/0335 (2013.01); H01L 23/544 (2013.01); H01L 2223/54426 (2013.01);
Abstract
Provided is a film for application to a 3D sample, the film including a photoresist layer that has alignment or direction marks thereon. After the fine pattern of the photoresist layer or coat is exposed, the photoresist layer is applied to a desired position of the 3D sample by aligning the alignment or direction marks of the film with alignment or direction marks on the 3D sample. This allows for transfer of an appropriate fine pattern. Part or all of the thickness or area of the photoresist layer is developed to form projections or depressions in the photoresist layer before the film is applied to the 3D sample.