The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 06, 2022
Filed:
Sep. 03, 2020
International Business Machines Corporation, Armonk, NY (US);
Ute Drechsler, Rueschlikon, CH;
Emanuel Marc Löertscher, Bonstetten, CH;
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method of processing a layer structure with a semiconductor layer to form metasurface structures is disclosed. The method relies on a layer structure that includes a substrate, a layer stack, and resist structures. The latter are made of a resist material that includes a semiconductor element. The layer stack is arranged on top of the substrate. The resist structures form a pattern on the layer stack. The layer stack includes: a semiconductor layer (arranged on top of the substrate); a protective layer (arranged on top of the semiconductor layer); and a transfer layer (arranged on top of the protective layer). The layer structure is obtained by forming the layer stack on top of the substrate, wherein the protective layer is deposited using an atomic-layer deposition process.