The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 06, 2022
Filed:
Aug. 04, 2017
Hitachi High-technologies Corporation, Tokyo, JP;
Daisuke Ebihara, Tokyo, JP;
Kenta Imai, Tokyo, JP;
Yoshihiro Yamashita, Tokyo, JP;
Shigeki Matsubara, Tokyo, JP;
Taku Sakazume, Tokyo, JP;
Hitachi High-Tech Corporation, Tokyo, JP;
Abstract
In order to aspire to higher sensitivity in an automatic analysis device, it is important to prevent the mixing of dust and the like in a reaction part in which a sample and a reagent react. The present invention presents an automatic analysis device that is provided with a configuration for making the pressure inside a specific block in the device such as a reaction part, or inside the device become positive. By making the pressure become positive and forming an air flow that flows out from the inside of the reaction part or the device, it is possible to limit, to a certain amount or less, the amount of dust penetrating into the reaction part.