The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 06, 2022
Filed:
Apr. 22, 2019
Peng Du, Beijing, CN;
Peng Du, Beijing, CN;
Other;
Abstract
An MBE system is disclosed for eliminating the excess flux in an MBE growth chamber before growth, during growth or growth interruption, and/or after growth by evaporating getter material from an effusion evaporator to the cold panel. The cold panel can be the cryopanel of the MBE growth chamber or a cold panel in an attached chamber. Said MBE system includes the cyropanel in the MBE growth chamber or a cold panel in the chamber attached to the MBE growth chamber. With a proper process such as cooling the cold panel, loading a substrate for the MBE process, providing necessary flux for the MBE growth, heating the effusion evaporator and opening the shutter for the evaporator to get the getter material flux onto the said panel, the excess flux will be eliminated. The cross contamination of the grown layer is then avoided.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile