The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 06, 2022

Filed:

Apr. 27, 2022
Applicant:

North China University of Technology, Beijing, CN;

Inventors:

Peixuan Ouyang, Beijing, CN;

Shuting Zhang, Beijing, CN;

Wei Sun, Beijing, CN;

Jinhe Yang, Beijing, CN;

Zhichao Dong, Beijing, CN;

Hang Li, Beijing, CN;

Lu Liu, Beijing, CN;

Yi Wen, Beijing, CN;

Cong Liu, Beijing, CN;

Yan Wu, Beijing, CN;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B22F 7/02 (2006.01); C23C 14/14 (2006.01); C22C 14/00 (2006.01); C23C 14/35 (2006.01); B22F 3/15 (2006.01); C23C 14/58 (2006.01);
U.S. Cl.
CPC ...
C23C 14/14 (2013.01); B22F 3/15 (2013.01); C22C 14/00 (2013.01); C23C 14/352 (2013.01); C23C 14/5806 (2013.01); B22F 2301/052 (2013.01); B22F 2301/205 (2013.01); B22F 2302/45 (2013.01); Y10T 428/12139 (2015.01);
Abstract

A titanium aluminide (TiAl) coating capable of improving high-temperature oxidation resistance of titanium alloys and a preparation method thereof are provided. The TiAl coating includes α-AlFnanoparticles, and a content of the α-AlFnanoparticles is 5-30 vol. % of the TiAl coating. The preparation method of the TiAl coating includes: using a TiAl alloy target and an α-AlFtarget as raw materials, and performing magnetron sputtering on a substrate surface to prepare a coating; the magnetron sputtering is double-target co-sputtering, and a substrate temperature during the magnetron sputtering is 150° C., the TiAl alloy target is performed direct current sputtering with a power of 0.5-2 kW, and the α-AlFtarget is performed radio frequency sputtering with a power of 0.07-0.2 kW. After the coating is obtained by the double-target co-sputtering, the obtained coating is heat-treated at 600-800° C. for 5-20 h to obtain a final coating.


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