The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 06, 2022

Filed:

Feb. 03, 2020
Applicant:

Ut-battelle, Llc, Oak Ridge, TN (US);

Inventors:

Sergei V. Kalinin, Oak Ridge, TN (US);

Stephen Jesse, Oak Ridge, TN (US);

Albina Y. Borisevich, Oak Ridge, TN (US);

Ondrej E. Dyck, Oak Ridge, TN (US);

Bobby G. Sumpter, Oak Ridge, TN (US);

Raymond R. Unocic, Oak Ridge, TN (US);

Assignee:

UT-BATTELLE, LLC, Oak Ridge, TN (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/317 (2006.01); G03F 7/20 (2006.01); B81C 99/00 (2010.01); B81C 1/00 (2006.01); B82Y 40/00 (2011.01);
U.S. Cl.
CPC ...
B81C 99/0065 (2013.01); B81C 1/00492 (2013.01); G03F 7/2059 (2013.01); H01J 37/3174 (2013.01); B81C 2201/0102 (2013.01); B81C 2201/0156 (2013.01); B82Y 40/00 (2013.01);
Abstract

A system and method (referred to as the system) fabricates controllable atomic assemblies in two and three dimensions. The systems identify by a non-invasive imager, a local atomic structure, distribution of vacancies, and dopant atoms and modify, by a microscopic modifier, the local atomic structure, via electron beam irradiation. The systems store, by a knowledge base, cause-and-effect relationships based on a non-invasive imaging and electron scans. The systems detect, by detectors, changes in the local atomic structure induced by the electron irradiation; and fabricate, a modified atomic structure by a beam control software and feedback.


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