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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11517975 B1

PDFFull Text
Date of Patent:
Dec. 06, 2022

Filed:

Nov. 20, 2018

Enhanced electron beam generation

Applicant:

Arcam Ab, Moelndal, SE;

Inventors:

Mattias Fager, Onsala, SE;

Johan Backlund, Onsala, SE;

Assignee:

Arcam AB, Moelndal, SE;

Attorney:

Dinsmore & Shohl LLP

Primary Examiner:

Joseph L Williams

Int. Cl.
CPC ...
H01J 37/147 (2006.01); H01J 37/10 (2006.01); H01J 37/063 (2006.01); B23K 15/00 (2006.01); H01J 37/18 (2006.01); H01J 37/09 (2006.01); B33Y 10/00 (2015.01); B33Y 30/00 (2015.01); B23K 15/06 (2006.01); B33Y 50/02 (2015.01); B29C 64/153 (2017.01); B29C 64/268 (2017.01); H01J 37/304 (2006.01); B29C 64/393 (2017.01); H01J 37/301 (2006.01); B22F 10/20 (2021.01); B22F 10/30 (2021.01);
U.S. Cl.
CPC ...
B23K 15/0086 (2013.01); B22F 10/20 (2021.01); B23K 15/002 (2013.01); B23K 15/0026 (2013.01); B23K 15/0046 (2013.01); B23K 15/06 (2013.01); B29C 64/153 (2017.08); B29C 64/268 (2017.08); B29C 64/393 (2017.08); B33Y 10/00 (2014.12); B33Y 30/00 (2014.12); B33Y 50/02 (2014.12); H01J 37/063 (2013.01); H01J 37/09 (2013.01); H01J 37/10 (2013.01); H01J 37/147 (2013.01); H01J 37/18 (2013.01); H01J 37/301 (2013.01); H01J 37/3045 (2013.01); B22F 10/30 (2021.01); H01J 2237/188 (2013.01); H01J 2237/1825 (2013.01); H01J 2237/316 (2013.01); H01J 2237/3128 (2013.01);
Abstract

An electron beam source including a cathode, an anode, a means for deflecting an electron beam over a target surface and at least one vacuum pump, the electron beam source further including a contraction area arranged between the anode and the means for deflecting the electron beam where a hole in the contraction area is aligned with a hole in the anode with respect to the cathode, a first vacuum pump is arranged between the contraction area and the anode and a second vacuum pump is arranged above the anode, a gas inlet is provided between the contraction area and the means for deflecting the electron beam, wherein a first crossover of the electron beam is arranged between the cathode and the anode and a second crossover is arranged at or in close proximity to the contraction area.

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