The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 06, 2022
Filed:
Nov. 17, 2017
Plasmacure B.v., Nijmegen, NL;
Johannes Pieter de Penning, Eindhoven, NL;
Paulien Smits, Eindhoven, NL;
Wouter Bastiaan Zeper, Eindhoven, NL;
PlasmaCure B.V., Nijmegen, NL;
Abstract
An electrode arrangement is described that is configured to be coupled to a high voltage source for a dielectric barrier discharge plasma treatment of an irregularly three-dimensionally shaped surface of an electrically conducting body. The three-dimensionally shaped surface is used as a counter electrode. A first planar electrode is coupled to the high voltage source via a first lead, fitted to the object to be treated and brought in contact with a dielectric. A second electrode is contacted with the surface to be treated as reference electrode. The second electrode is provided in an edge portion that is circumferential to the first planar electrode and configured to be coupled to a reference voltage source via a second lead. An isolating cover layer covers the electrode and a third electrode covers the isolating cover layer as a ground electrode.