Method of manufacturing silicon carbide semiconductor device, method of manufacturing silicon carbide substrate, and silicon carbide substrate

Abstract

A method of manufacturing a silicon carbide substrate having a parallel pn layer. The method includes preparing a starting substrate containing silicon carbide, forming a first partial parallel pn layer on the starting substrate by a trench embedding epitaxial process, stacking a second partial parallel pn layer by a multi-stage epitaxial process on the first partial parallel pn layer, and stacking a third partial parallel pn layer on the second partial parallel pn layer by another trench embedding epitaxial process. Each of the first, second and third partial parallel pn layers is formed to include a plurality of first-conductivity-type regions and a plurality of second-conductivity-type regions alternately disposed in parallel to a main surface of the silicon carbide substrate. The first-conductivity-type regions of the first and third partial parallel pn layers face each other in a depth direction of the silicon carbide substrate, and the second-conductivity-type regions partial parallel pn layers face each other in the depth direction.