The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 29, 2022
Filed:
Oct. 26, 2020
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventor:
Laksheswar Kalita, San Jose, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/687 (2006.01); H01L 21/67 (2006.01); H01J 7/32 (2006.01); H01J 37/305 (2006.01); H01J 37/32 (2006.01); H01L 21/3065 (2006.01); C23C 16/44 (2006.01);
U.S. Cl.
CPC ...
H01L 21/68757 (2013.01); H01J 37/3053 (2013.01); H01J 37/32477 (2013.01); H01J 37/32715 (2013.01); H01L 21/6708 (2013.01); H01L 21/67207 (2013.01); H01L 21/6875 (2013.01); C23C 16/4404 (2013.01); H01J 37/32495 (2013.01); H01L 21/3065 (2013.01); H01L 21/6719 (2013.01);
Abstract
Exemplary semiconductor processing chambers may include a chamber body. The chambers may include a showerhead. The chambers may include a substrate support. The substrate support may include a platen characterized by a first surface facing the showerhead. The substrate support may include a shaft coupled with the platen along a second surface of the platen opposite the first surface of the platen. The shaft may extend at least partially through the chamber body. A coating may extend conformally about the first surface of the platen, the second surface of the platen, and about the shaft.