The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 29, 2022
Filed:
Dec. 06, 2019
Applicant:
The Charles Stark Draper Laboratory Inc., Cambridge, MA (US);
Inventor:
Isaac Ehrenberg, Brookline, MA (US);
Assignee:
The Charles Stark Draper Laboratory Inc., Cambridge, MA (US);
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/34 (2006.01); C23C 14/34 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3432 (2013.01); C23C 14/34 (2013.01); H01J 37/32431 (2013.01); H01J 37/32449 (2013.01); H01J 2237/332 (2013.01);
Abstract
A thin-film system comprising a microplasma region where sputtered particles are formed, a power supply that supplies power to the microplasma region, gas flow hardware to regulate flow of gas to the microplasma region, a deposition nozzle that forms a thin film on a substrate and a supply line for supplying sputtered particles to the deposition nozzle, wherein the microplasma region is decoupled from the deposition nozzle.