The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 29, 2022

Filed:

Jun. 18, 2020
Applicant:

Panasonic Intellectual Property Management Co., Ltd., Osaka, JP;

Inventors:

Takuya Imaoka, Kanagawa, JP;

Hideo Onishi, Osaka, JP;

Kenji Ikeo, Osaka, JP;

Katsu Yamada, Osaka, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 13/00 (2006.01); G02B 13/16 (2006.01); G02B 15/14 (2006.01); G02B 13/22 (2006.01); G02B 15/15 (2006.01);
U.S. Cl.
CPC ...
G02B 13/16 (2013.01); G02B 13/0095 (2013.01); G02B 13/22 (2013.01); G02B 15/143507 (2019.08); G02B 15/15 (2013.01);
Abstract

A projection lens system that projects an image of a reduction side into a magnification side includes a diaphragm, a plurality of positive lenses, and a plurality of negative lenses. The plurality of positive lenses include a first positive lens closer to the magnification side than the diaphragm is and closest to the diaphragm, a second positive lens second closest to the diaphragm after the first positive lens on the magnification side, a third positive lens closer to the reduction side than the diaphragm is and closest to the diaphragm. The plurality of negative lenses include a first negative lens closer to the magnification side than the diaphragm is and closest to the diaphragm, and a second negative lens closer to the reduction side than the diaphragm is and closest to the diaphragm. The lenses have transmittances larger than threshold values, respectively.


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