The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 29, 2022
Filed:
Aug. 06, 2020
Applicant:
Merck Patent Gmbh, Darmstadt, DE;
Inventors:
Assignee:
MERCK PATENT GMBH, Darmstadt, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08G 77/18 (2006.01); C08J 9/14 (2006.01);
U.S. Cl.
CPC ...
C08G 77/18 (2013.01); C08J 9/142 (2013.01); C08J 2203/12 (2013.01); C08J 2383/06 (2013.01);
Abstract
To provide a low dielectric constant siliceous film manufacturing composition capable of forming a low dielectric constant siliceous film with dispersed pores having excellent mechanical properties and stable electrical properties. [Means] The present invention provides a low dielectric constant siliceous film manufacturing composition comprising: a polysiloxane, a pore-generating material, a condensation catalyst generator, and a solvent.
Aida, Kensuke. (2022). Low dielectric constant siliceous film manufacturing composition and methods for producing cured film and electronic device using the same (U.S. Patent No. 11512171). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11512171
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile