The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 22, 2022
Filed:
Oct. 24, 2019
Applicant:
Samsung Display Co., Ltd., Yongin-Si, KR;
Inventors:
Jeongkuk Kim, Suwon-si, KR;
Kyuhwan Hwang, Seongnam-si, KR;
Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 51/00 (2006.01); H01L 51/56 (2006.01);
U.S. Cl.
CPC ...
H01L 51/0027 (2013.01); H01L 51/0002 (2013.01); H01L 51/56 (2013.01);
Abstract
A method for manufacturing a mask may include the following steps: preparing a substrate; providing a first coating, which may be optically transparent, may cover a covered portion of the substrate, and may expose exposed portions of the substrate; forming a scattering layer between the first coating layer and the covered portion of the substrate; and removing the exposed portions of the substrate to form mask holes.