The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 22, 2022
Filed:
Jan. 27, 2021
Applicant:
Samsung Display Co., Ltd., Yongin-Si, KR;
Inventors:
Assignee:
SAMSUNG DISPLAY CO., LTD., Gyeonggi-Do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/12 (2006.01); H01L 21/67 (2006.01); H01L 21/3213 (2006.01); H01L 21/677 (2006.01);
U.S. Cl.
CPC ...
H01L 27/1266 (2013.01); H01L 21/32134 (2013.01); H01L 21/6708 (2013.01); H01L 21/67075 (2013.01); H01L 21/6776 (2013.01); H01L 21/67173 (2013.01); H01L 21/67253 (2013.01); H01L 27/1225 (2013.01); H01L 27/1288 (2013.01); H01L 27/124 (2013.01); H01L 27/1259 (2013.01);
Abstract
A substrate processing apparatus includes a first process chamber in which a target substrate is processed, a first tank connected to the first process chamber to supply a first chemical to the first process chamber, a second process chamber in which the target substrate is processed, and a second tank connected to the second process chamber to supply a second chemical to the second process chamber. A metal ion contained in the first chemical supplied to the first process chamber has an ion concentration greater than an ion concentration of the metal ion contained in the second chemical supplied to the second process chamber.