The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 22, 2022
Filed:
May. 23, 2018
Applicant:
Fuji Corporation, Chiryu, JP;
Inventor:
Takahiro Jindo, Anjo, JP;
Assignee:
FUJI CORPORATION, Chiryu, JP;
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); H01J 37/244 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32816 (2013.01); H01J 37/244 (2013.01); H01J 37/32449 (2013.01); H01J 37/32944 (2013.01);
Abstract
A plasma processing apparatus, for releasing plasma-converted gas from plasma head for performing process, detects the pressures of a gas prior to application of a voltage to electrodes of the plasma head, the gas being supplied from gas supply section to a plasma head, and allow initiation of process by the plasma processing apparatus based on the detected pressures.