The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 22, 2022
Filed:
Aug. 31, 2018
Hitachi High-tech Corporation, Tokyo, JP;
Hitachi High-Tech Corporation, Tokyo, JP;
Abstract
Provided is an ion milling device capable of improving the reproducibility of an ion distribution. An ion milling device includes: an ion source (); a sample stage () on which a sample () to be processed by being irradiated with an unfocused ion beam from the ion source () is placed; and a drive unit () configured to be arranged between the ion source () and the sample stage (), and to move a linear ion beam measuring member () extending in a first direction to a second direction orthogonal to the first direction, in which the drive unit () moves the ion beam measuring member () within an emission range of the ion beam in a state where the ion beam is outputted from the ion source () under a first emission condition, and an ion beam current flowing through the ion beam measuring member () is measured by irradiating the ion beam measuring member () with the ion beam.