The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 22, 2022

Filed:

Jun. 17, 2015
Applicant:

Canon Anelva Corporation, Kawasaki, JP;

Inventors:

Masashi Tsujiyama, Kawasaki, JP;

Yasushi Yasumatsu, Kawasaki, JP;

Kaori Motochi, Kawasaki, JP;

Assignee:

CANON ANELVA CORPORATION, Kawasakishi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/147 (2006.01); H01J 37/32 (2006.01); H01J 27/02 (2006.01); H01J 27/16 (2006.01);
U.S. Cl.
CPC ...
H01J 37/147 (2013.01); H01J 27/024 (2013.01); H01J 37/32357 (2013.01); H01J 37/32422 (2013.01); H01J 27/16 (2013.01); H01J 2237/334 (2013.01);
Abstract

An object of the invention is to provide a grid assembly which is easy to assemble and is high in assembly reproducibility, and an ion beam etching apparatus including it. A grid assembly is constructed of three grids each in the shape of a circular plate, which are stacked one on top of another. The grid assembly includes three fixing holes for fixing the three grids, and three positioning holes for positioning the three grids. In assembly, the three grids are stacked one on top of another on a first ring so that positioning pins provided on the first ring are inserted into the positioning holes. Then, a second ring is stacked on top of the three grids, and bolts are inserted into the fixing holes. Thus, positioning is performed by using the fixed positioning pins and thereafter the fixing can be performed, which facilitates the assembly.


Find Patent Forward Citations

Tsujiyama, Masashi. (2022). Grid assembly and ion beam etching apparatus (U.S. Patent No. 11508545). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11508545

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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